High-Precision ALD platform for advanced manufacturing and R&D
SYSTEM OVERVIEWThe Aurora ALD system by Cambridge NanoTech is a precision thin-film deposition platform designed for atomiclayer deposition (ALD) processes. It enables conformal, pinhole-free coatings with angstrom-level thickness control.
PRIMARY APPLICATIONS
• Semiconductor fabrication
• Nanotechnology research
• Battery and energy coatings
• MEMS and sensors
• Barrier and dielectric films
KEY COMPONENTS
Reaction chamber, precursor delivery, vacuum system, thermal control, and computer-based process control.
TYPICAL PERFORMANCE
Angstrom-level thickness control Highly uniform coatings Repeatable ALD processes
HOW IT WORKS
Sequential precursor pulsing deposits one atomic layer per cycle, building precise thin films.
INSTALLATION REQUIREMENTS
Electrical service, process gases, exhaust/scrubber, compressed air, and controlled environment.
