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Oxford Plasmalab 100 PECVD System

Oxford Plasmalab 100 PECVD System

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Description

Advanced PECVD System for Thin Film Deposition & Etch Applications

Key Features

Oxford Instruments Plasmalab System 100

Comdel LF Generator Upgrade-First Solar part number 94-219969U1

Pc2003 RF Generator Interface Architecture

Multiple RF Channels for Independent Process Control

Integrated Power Distribution & Matching Network

Reliable Oxford Instruments Technology Built for Demanding Environments

Used- Excellent, Pulled from operational environment