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HITACHI CD SEM 9260

HITACHI CD SEM 9260

HITACHI CD SEM 9260 - Image 2

HITACHI CD SEM 9260

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Categories Member Products, Metrology

Description

Imaging & Resolution: 3 nm (3×10−9m) at 800V accelerating voltage, with magnification up to 300,000x.
Wafer Size: Primarily supports 200mm (8-inch) wafers with options for 300mm configurations.
Performance Monitor: Includes a built-in optical monitor to check the condition of optical mechanisms for better reliability.
Automation: Equipped with automated beam calibration and image processing tools for high-precision CD measurements.
Applications: Ideal for measuring 100 nm nodes for line/space and hole patterns, along with high-selectivity etching, according to a 2002