The SF130 provides a balance of high throughput and precision for mature process nodes.
-
- Light Source: i-line mercury lamp (365 nm wavelength).
- Resolution:
≤
≤
280 nm (0.28 μm).
- Exposure Field: 25 x 33 mm (standard wide-field, matching DUV scanners for easier integration).
- Numerical Aperture (NA): ~0.50.
- Throughput:
- 200 mm (8″) Wafers:
≥
≥
120 wafers per hour.
- 300 mm (12″) Wafers: ~100–117 wafers per hour.
- Alignment Accuracy:
≤
≤
35 nm (
𝑀
+
3
