Programmable Spin Processor | Up to ø150mm Substrates | 12,000 RPM Max
Overview
•Laurell WS-650Hz-23NPPB programmable spin coater / processor
•Accommodates up to ø150mm (6″) wafers and 5″ × 5″ (127mm × 127mm) substrates
•Maximum rotational speed: 12,000 RPM (substrate-dependent)
•650-series microprocessor controller with real-time operator interaction
•Compatible with Laurell Spin 3000 PC software — remote operation, process recording, LAN/Internet connectivity
•Compact benchtop form factor — universal power input: 95–240 VAC, 47/63 Hz, ~300WKey Features
•Chemically resistant NPP co-polymer housing — solvent, acid, and base resistant
•Proprietary labyrinth seal — sub-micron particle-free motor and electronics protection
•Closed bowl design eliminates splash-back; internal gutter channels fluid away from substrate
•Process safeguard prevents accidental re-processing of substrates
•Field-upgradeable with plug-in modules — no factory return required; unlimited programmable processes and steps
•Nitrogen purge capability for process chamber; CE, RoHS, ETL certified; UL/CSA approved components
•Bluetooth-equipped model (NPPB designation)
Applications
•Photoresist spin coating
•Sol-gel and polymer thin film deposition
•Wafer cleaning, etching, and developing
•MEMS fabrication and semiconductor R&D;
•Academic and industrial cleanroom use
Included Items
•Laurell WS-650Hz-23NPPB spin coater unit with process controller
•Original factory packaging, documentation, and accessories
•Standard vacuum chuck and fragment adapter